Publication:
Remediation for TXRF saturation effects on micro-droplet residues from preconcentration methods on semiconductor wafers
Date
| dc.contributor.author | Hellin, David | |
| dc.contributor.author | Rip, Jens | |
| dc.contributor.author | Geens, Veerle | |
| dc.contributor.author | Delande, Tinne | |
| dc.contributor.author | Conard, Thierry | |
| dc.contributor.author | De Gendt, Stefan | |
| dc.contributor.author | Vinckier, Chris | |
| dc.contributor.imecauthor | Hellin, David | |
| dc.contributor.imecauthor | Rip, Jens | |
| dc.contributor.imecauthor | Delande, Tinne | |
| dc.contributor.imecauthor | Conard, Thierry | |
| dc.contributor.imecauthor | De Gendt, Stefan | |
| dc.contributor.orcidimec | Conard, Thierry::0000-0002-4298-5851 | |
| dc.contributor.orcidimec | De Gendt, Stefan::0000-0003-3775-3578 | |
| dc.date.accessioned | 2021-10-16T01:59:03Z | |
| dc.date.available | 2021-10-16T01:59:03Z | |
| dc.date.issued | 2005 | |
| dc.identifier.uri | https://imec-publications.be/handle/20.500.12860/10567 | |
| dc.source.beginpage | 652 | |
| dc.source.endpage | 658 | |
| dc.source.issue | 7 | |
| dc.source.journal | Journal of Analytical Atomic Spectrometry | |
| dc.source.volume | 20 | |
| dc.title | Remediation for TXRF saturation effects on micro-droplet residues from preconcentration methods on semiconductor wafers | |
| dc.type | Journal article | |
| dspace.entity.type | Publication | |
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