Degradation of deep ultraviolet photoresist by As-implantation studied by Ar-cluster beam profiling

dc.contributor.author	Conard, Thierry
dc.contributor.author	Franquet, Alexis
dc.contributor.author	Tsvetanova, Diana
dc.contributor.author	Mouhib, Tariq
dc.contributor.author	Vandervorst, Wilfried
dc.contributor.imecauthor	Conard, Thierry
dc.contributor.imecauthor	Franquet, Alexis
dc.contributor.imecauthor	Tsvetanova, Diana
dc.contributor.imecauthor	Vandervorst, Wilfried
dc.contributor.orcidimec	Conard, Thierry::0000-0002-4298-5851
dc.contributor.orcidimec	Franquet, Alexis::0000-0002-7371-8852
dc.date.accessioned	2021-10-21T07:01:54Z
dc.date.available	2021-10-21T07:01:54Z
dc.date.issued	2013
dc.identifier.issn	0142-2421
dc.identifier.uri	https://imec-publications.be/handle/20.500.12860/22166
dc.identifier.url	http://onlinelibrary.wiley.com/doi/10.1002/sia.5126/abstract
dc.source.beginpage	406
dc.source.endpage	408
dc.source.issue	1
dc.source.journal	Surface and Interface Analysis
dc.source.volume	45
dc.title	Degradation of deep ultraviolet photoresist by As-implantation studied by Ar-cluster beam profiling
dc.type	Journal article
dspace.entity.type	Publication
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