Publication:
Study of Endurance Performance of SiO2 Interfacial Layer Scaling Through O Scavenging in Si Channel n-FeFET With Si:HfO2 Ferroelectric Layer
| dc.contributor.author | Agarwal, A. | |
| dc.contributor.author | Walke, Amey | |
| dc.contributor.author | Ronchi, Nicolo | |
| dc.contributor.author | Kao, K. -H. | |
| dc.contributor.author | Van Houdt, Jan | |
| dc.contributor.imecauthor | Walke, Amey | |
| dc.contributor.imecauthor | Ronchi, Nicolo | |
| dc.contributor.imecauthor | Van Houdt, Jan | |
| dc.contributor.orcidimec | Walke, Amey::0000-0001-8406-8122 | |
| dc.contributor.orcidimec | Ronchi, Nicolo::0000-0002-7961-4077 | |
| dc.contributor.orcidimec | Van Houdt, Jan::0000-0003-1381-6925 | |
| dc.date.accessioned | 2025-07-03T14:13:10Z | |
| dc.date.available | 2024-06-24T17:51:15Z | |
| dc.date.available | 2025-07-03T14:13:10Z | |
| dc.date.issued | 2024 | |
| dc.description.wosFundingText | No Statement Available | |
| dc.identifier.doi | 10.1109/TED.2024.3409204 | |
| dc.identifier.issn | 0018-9383 | |
| dc.identifier.uri | https://imec-publications.be/handle/20.500.12860/44085 | |
| dc.publisher | IEEE-INST ELECTRICAL ELECTRONICS ENGINEERS INC | |
| dc.source.beginpage | 4619 | |
| dc.source.endpage | 4625 | |
| dc.source.issue | 8 | |
| dc.source.journal | IEEE TRANSACTIONS ON ELECTRON DEVICES | |
| dc.source.numberofpages | 7 | |
| dc.source.volume | 71 | |
| dc.subject.keywords | IMPACT | |
| dc.title | Study of Endurance Performance of SiO2 Interfacial Layer Scaling Through O Scavenging in Si Channel n-FeFET With Si:HfO2 Ferroelectric Layer | |
| dc.type | Journal article | |
| dspace.entity.type | Publication | |
| Files | ||
| Publication available in collections: |