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Development of a new post-etch photoresist stripper for copper BEOL process
Publication:
Development of a new post-etch photoresist stripper for copper BEOL process
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Date
2007
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16217.pdf
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APA
Chicago
Harvard
IEEE
Basic data
APA
Chicago
Harvard
IEEE
Author(s)
Du, Bing
;
Kneer, Emil
;
Townsend, P.H.
;
Le, Quoc Toan
;
Hendrickx, Dirk
;
Vereecke, Guy
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1890
since deposited on 2021-10-16
Acq. date: 2025-12-10
Citations
Metrics
Views
1890
since deposited on 2021-10-16
Acq. date: 2025-12-10
Citations