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Synthesis of CoxFe1-xSi2 with high dose ion implantation and reactive codeposition epitaxy

Date

1995
Proceedings Paper
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dc.contributor.authorVantomme, Andre
dc.contributor.authorWu, Ming Fang
dc.contributor.authorDegroote, S.
dc.contributor.authorDekoster, J.
dc.contributor.authorLangouche, G.
dc.contributor.authorTavares, J.
dc.contributor.authorBender, Hugo
dc.contributor.imecauthorVantomme, Andre
dc.contributor.imecauthorBender, Hugo
dc.date.accessioned2021-09-29T13:22:38Z
dc.date.available2021-09-29T13:22:38Z
dc.date.embargo9999-12-31
dc.date.issued1995
dc.identifier.urihttps://imec-publications.be/handle/20.500.12860/978
dc.source.beginpage926
dc.source.conferenceIon Implantation Technology - 94
dc.source.conferencedate13/06/1994
dc.source.conferencelocationCatania Italy
dc.source.endpage929
dc.title

Synthesis of CoxFe1-xSi2 with high dose ion implantation and reactive codeposition epitaxy

dc.typeProceedings paper
dspace.entity.typePublication
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