Publication:

Multiple patterning...various keys for scaling

Date

2010
Proceedings Paper
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dc.contributor.authorWiaux, Vincent
dc.contributor.authorWong, Patrick
dc.contributor.authorVandenbroeck, Nadia
dc.contributor.authorBekaert, Joost
dc.contributor.authorLaenens, Bart
dc.contributor.authorDe Bisschop, Peter
dc.contributor.authorVersluijs, Janko
dc.contributor.authorVandenberghe, Geert
dc.contributor.imecauthorWiaux, Vincent
dc.contributor.imecauthorWong, Patrick
dc.contributor.imecauthorVandenbroeck, Nadia
dc.contributor.imecauthorBekaert, Joost
dc.contributor.imecauthorDe Bisschop, Peter
dc.contributor.imecauthorVersluijs, Janko
dc.contributor.imecauthorVandenberghe, Geert
dc.contributor.orcidimecWong, Patrick::0000-0003-3605-9680
dc.contributor.orcidimecBekaert, Joost::0000-0003-3075-3479
dc.date.accessioned2021-10-19T00:26:27Z
dc.date.available2021-10-19T00:26:27Z
dc.date.embargo9999-12-31
dc.date.issued2010
dc.identifier.urihttps://imec-publications.be/handle/20.500.12860/18351
dc.source.conferenceLLithography Workshop
dc.source.conferencedate7/11/2010
dc.source.conferencelocationLihue, HI USA
dc.title

Multiple patterning...various keys for scaling

dc.typeProceedings paper
dspace.entity.typePublication
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