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Critical dimension uniformity and contact edge roughness in extreme ultraviolet lithography: effect of photoacid generator, sensitizer and quencher
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Critical dimension uniformity and contact edge roughness in extreme ultraviolet lithography: effect of photoacid generator, sensitizer and quencher
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Date
2013
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APA
Chicago
Harvard
IEEE
Basic data
APA
Chicago
Harvard
IEEE
Author(s)
Murugesan Kuppuswamy, Vijaya-Kumar
;
Constantoudis, Vassilios
;
Gogolides, Evangelos
;
Vaglio Pret, Alessandro
;
Gronheid, Roel
Journal
Journal of Micro/Nanolithography MEMS and MOEMS
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1935
since deposited on 2021-10-21
Acq. date: 2025-12-10
Citations
Metrics
Views
1935
since deposited on 2021-10-21
Acq. date: 2025-12-10
Citations