Publication:

Hyper-NA imaging of 45nm node random CH layouts using inverse lithography

Date

2008
Proceedings Paper
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dc.contributor.authorHendrickx, Eric
dc.contributor.authorTritchkov, Alexander
dc.contributor.authorSakajiri, Kyohei
dc.contributor.authorGranik, Yuri
dc.contributor.authorKempsell, Monica
dc.contributor.authorVandenberghe, Geert
dc.contributor.imecauthorHendrickx, Eric
dc.contributor.imecauthorVandenberghe, Geert
dc.date.accessioned2021-10-17T07:36:24Z
dc.date.available2021-10-17T07:36:24Z
dc.date.embargo9999-12-31
dc.date.issued2008
dc.identifier.urihttps://imec-publications.be/handle/20.500.12860/13857
dc.source.beginpage68240L
dc.source.conferenceOptical Microlithography XXI
dc.source.conferencedate24/02/2008
dc.source.conferencelocationSan Jose, CA USA
dc.title

Hyper-NA imaging of 45nm node random CH layouts using inverse lithography

dc.typeProceedings paper
dspace.entity.typePublication
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