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Evaluation of cleaning recipes based on ozonated water for pre-gate oxide cleaning

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dc.contributor.authorJeon, J. S.
dc.contributor.authorOgle, B.
dc.contributor.authorBaeyens, Martien
dc.contributor.authorMertens, Paul
dc.contributor.imecauthorMertens, Paul
dc.date.accessioned2021-10-06T11:26:36Z
dc.date.available2021-10-06T11:26:36Z
dc.date.embargo9999-12-31
dc.date.issued1999
dc.identifier.urihttps://imec-publications.be/handle/20.500.12860/3538
dc.source.beginpage119
dc.source.conferenceUltra Clean Processing of Silicon Surfaces; Proceedings of the 4th International Symposium on Ultra Clean Processing of Silicon
dc.source.conferencedate21/09/1998
dc.source.conferencelocationOostende Belgium
dc.source.endpage122
dc.title

Evaluation of cleaning recipes based on ozonated water for pre-gate oxide cleaning

dc.typeProceedings paper
dspace.entity.typePublication
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