Publication:

Transient-assisted plasma etching (TAPE): Concept, mechanism, and prospects

Date

2024
Journal article
https://doi.org/10.1116/6.0003380
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dc.contributor.authorFathzadeh, Atefeh
dc.contributor.authorBezard, Philippe
dc.contributor.authorDarnon, Maxime
dc.contributor.authorManders, Inge
dc.contributor.authorConard, Thierry
dc.contributor.authorHoflijk, Ilse
dc.contributor.authorLazzarino, Frederic
dc.contributor.authorDe Gendt, Stefan
dc.contributor.imecauthorFathzadeh, Atefeh
dc.contributor.imecauthorBezard, Philippe
dc.contributor.imecauthorManders, Inge
dc.contributor.imecauthorConard, Thierry
dc.contributor.imecauthorHoflijk, Ilse
dc.contributor.imecauthorLazzarino, Frederic
dc.contributor.imecauthorde Gendt, Stefan
dc.contributor.orcidimecFathzadeh, Atefeh::0000-0003-4505-2798
dc.contributor.orcidimecBezard, Philippe::0000-0003-2499-0240
dc.contributor.orcidimecConard, Thierry::0000-0002-4298-5851
dc.contributor.orcidimecLazzarino, Frederic::0000-0001-7961-9727
dc.contributor.orcidimecDe Gendt, Stefan::0000-0003-3775-3578
dc.date.accessioned2025-06-26T08:35:57Z
dc.date.available2024-04-13T16:46:18Z
dc.date.available2025-06-26T08:35:57Z
dc.date.issued2024
dc.identifier.doi10.1116/6.0003380
dc.identifier.issn0734-2101
dc.identifier.urihttps://imec-publications.be/handle/20.500.12860/43821
dc.publisherA V S AMER INST PHYSICS
dc.source.beginpageArt. 033006
dc.source.endpageN/A
dc.source.issue3
dc.source.journalJOURNAL OF VACUUM SCIENCE & TECHNOLOGY A
dc.source.numberofpages10
dc.source.volume42
dc.subject.keywordsAMORPHOUS-CARBON
dc.subject.keywordsATOMIC OXYGEN
dc.subject.keywordsSPECTROSCOPY
dc.subject.keywordsACTINOMETRY
dc.subject.keywordsSPECTRA
dc.subject.keywordsRATIO
dc.title

Transient-assisted plasma etching (TAPE): Concept, mechanism, and prospects

dc.typeJournal article
dspace.entity.typePublication
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