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High-Fidelity Directed Self-Assembly Using Higher-<i>Ï </i> Polystyrene-<i>Block</i>-Poly(Methyl Methacrylate) Derivatives for Dislocation-Free Sub-10 nm Features

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dc.contributor.authorMaekawa, Shinsuke
dc.contributor.authorVerstraete, Lander
dc.contributor.authorSuh, Hyo Seon
dc.contributor.authorSeshimo, Takehiro
dc.contributor.authorDazai, Takahiro
dc.contributor.authorSato, Kazufumi
dc.contributor.authorHatakeyama-Sato, Kan
dc.contributor.authorNabae, Yuta
dc.contributor.authorHayakawa, Teruaki
dc.contributor.imecauthorVerstraete, Lander
dc.contributor.imecauthorSuh, Hyo Seon
dc.contributor.orcidimecVerstraete, Lander::0000-0002-3679-811X
dc.contributor.orcidimecSuh, Hyo Seon::0000-0003-4370-5062
dc.date.accessioned2025-02-27T19:41:24Z
dc.date.available2025-02-27T19:41:24Z
dc.date.issued2025-FEB 12
dc.description.wosFundingTextThe manuscript was written with contributions from all the authors. All the authors approved the final version of the manuscript. The authors thank Dr. Noboru Ohta (JASRI) and Prof. Tomoyasu Hirai (Osaka Institute of Technology) for SAXS measurements at the BL40B2 beamline of SPring-8 (Proposal no. 2024A1166). The authors also thank Ryohei Kikuchi (Core Facility Center, Institute of Science Tokyo) for the TEM and cross-sectional SEM support. This work was supported by JSPS KAKENHI (grant numbers 20H02785 and 24H00052). S. M. was supported by JST SPRING (grant numbers: JPMJSP2106 and JPMJSP2180).
dc.identifier.doi10.1002/adfm.202421066
dc.identifier.issn1616-301X
dc.identifier.urihttps://imec-publications.be/handle/20.500.12860/45265
dc.publisherWILEY-V C H VERLAG GMBH
dc.source.journalADVANCED FUNCTIONAL MATERIALS
dc.source.numberofpages11
dc.subject.keywordsCOPOLYMER THIN-FILMS
dc.subject.keywordsBLOCK-COPOLYMERS
dc.subject.keywordsCHEMICAL-PATTERNS
dc.subject.keywordsMICRODOMAINS
dc.subject.keywordsPHOTORESISTS
dc.subject.keywordsLITHOGRAPHY
dc.subject.keywordsSEGREGATION
dc.subject.keywordsPOLYMERS
dc.title

High-Fidelity Directed Self-Assembly Using Higher-Ï Polystyrene-Block-Poly(Methyl Methacrylate) Derivatives for Dislocation-Free Sub-10 nm Features

dc.typeJournal article
dspace.entity.typePublication
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