Publication:

Optimization of Point-Of-Use Filtration for Metal Oxide Photoresist

Date

2021
Proceedings Paper
https://doi.org/10.1117/12.2583842
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dc.contributor.authorWu, Aiwen
dc.contributor.authorTang, Harvey
dc.contributor.authorConner, Gregg
dc.contributor.authorChang, Shu Hao
dc.contributor.authorGiordano, Gaetano
dc.contributor.authorSmiddy, Dominick
dc.contributor.authorGeniza, Mark
dc.contributor.authorClark, Benjamin L.
dc.contributor.imecauthorChang, Shu Hao
dc.contributor.imecauthorGiordano, Gaetano
dc.date.accessioned2023-01-17T08:16:54Z
dc.date.available2022-09-08T02:39:17Z
dc.date.available2023-01-17T08:16:54Z
dc.date.issued2021
dc.identifier.doi10.1117/12.2583842
dc.identifier.eisbn978-1-5106-4058-0
dc.identifier.isbn978-1-5106-4057-3
dc.identifier.issn0277-786X
dc.identifier.urihttps://imec-publications.be/handle/20.500.12860/40387
dc.publisherSPIE-INT SOC OPTICAL ENGINEERING
dc.source.beginpage116120X
dc.source.conferenceConference on Advances in Patterning Materials and Processes XXXVIII Part of SPIE Advanced Lithography Conference
dc.source.conferencedateFEB 22-26, 2021
dc.source.conferencelocationVirtual
dc.source.journalProceedings of SPIE
dc.source.numberofpages8
dc.source.volume11612
dc.title

Optimization of Point-Of-Use Filtration for Metal Oxide Photoresist

dc.typeProceedings paper
dspace.entity.typePublication
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