Publication:

EUV lithographic process enablement with novel litho track hardware

Date

2021
Proceedings Paper
https://doi.org/10.1117/12.2584515
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dc.contributor.authorSantos, Andreia
dc.contributor.authorKosma, Vasiliki
dc.contributor.authorVandereyken, Jelle
dc.contributor.authorMarhfour, H.
dc.contributor.authorTanaka, Y.
dc.contributor.authorHarumoto, M.
dc.contributor.authorAsai, M.
dc.contributor.authorStokes, H.
dc.contributor.authorSuh, Hyo Seon
dc.contributor.authorFoubert, Philippe
dc.contributor.authorDe Simone, Danilo
dc.contributor.imecauthorKosma, Vasiliki
dc.contributor.imecauthorVandereyken, Jelle
dc.contributor.imecauthorSuh, Hyo Seon
dc.contributor.imecauthorFoubert, Philippe
dc.contributor.imecauthorDe Simone, Danilo
dc.contributor.orcidimecDe Simone, Danilo::0000-0003-3927-5207
dc.date.accessioned2022-09-08T15:24:27Z
dc.date.available2022-09-08T02:39:17Z
dc.date.available2022-09-08T15:24:27Z
dc.date.issued2021
dc.identifier.doi10.1117/12.2584515
dc.identifier.eisbn978-1-5106-4058-0
dc.identifier.isbn978-1-5106-4057-3
dc.identifier.issn0277-786X
dc.identifier.urihttps://imec-publications.be/handle/20.500.12860/40388
dc.publisherSPIE-INT SOC OPTICAL ENGINEERING
dc.source.beginpage116120M
dc.source.conferenceConference on Advances in Patterning Materials and Processes XXXVIII Part of SPIE Advanced Lithography Conference
dc.source.conferencedateFEB 22-26, 2021
dc.source.conferencelocationVirtual
dc.source.journalProceedings of SPIE
dc.source.numberofpages8
dc.source.volume11612
dc.subject.keywordsCOLD DEVELOPMENT
dc.subject.keywordsIMPROVEMENT
dc.title

EUV lithographic process enablement with novel litho track hardware

dc.typeProceedings paper
dspace.entity.typePublication
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