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Modeling the influence of gas composition in an Ar/Cl2/O2 inductively coupled plasma used for STI etching
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1904 since deposited on 2021-10-18
3last month
Acq. date: 2025-12-11
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Metrics
Views
1904 since deposited on 2021-10-18
3last month
Acq. date: 2025-12-11
Citations