Publication:
Modeling the influence of gas composition in an Ar/Cl2/O2 inductively coupled plasma used for STI etching
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1905 since deposited on 2021-10-18
1last month
Acq. date: 2026-08-10
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Statistics
Views
1905 since deposited on 2021-10-18
1last month
Acq. date: 2026-08-10
Citations