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Direct observation of both contact and remote oxygen scavenging of GeO2 in a metal-oxide-semiconductor stack

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dc.contributor.authorFadida, Sivan
dc.contributor.authorShekhter, P.
dc.contributor.authorCvetko, D.
dc.contributor.authorFloreano, L.
dc.contributor.authorVerdini, A
dc.contributor.authorNyns, Laura
dc.contributor.authorVan Elshocht, Sven
dc.contributor.authorKymissis, I.
dc.contributor.authorEizenberg, Moshe
dc.contributor.imecauthorNyns, Laura
dc.contributor.imecauthorVan Elshocht, Sven
dc.contributor.orcidimecNyns, Laura::0000-0001-8220-870X
dc.contributor.orcidimecVan Elshocht, Sven::0000-0002-6512-1909
dc.date.accessioned2021-10-22T01:24:55Z
dc.date.available2021-10-22T01:24:55Z
dc.date.issued2014
dc.identifier.issn0021-8979
dc.identifier.urihttps://imec-publications.be/handle/20.500.12860/23801
dc.identifier.urlhttp://dx.doi.org/10.1063/1.4898645
dc.source.beginpage164101
dc.source.issue16
dc.source.journalJournal of Applied Physics
dc.source.volume116
dc.title

Direct observation of both contact and remote oxygen scavenging of GeO2 in a metal-oxide-semiconductor stack

dc.typeJournal article
dspace.entity.typePublication
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