Electronic structure of NiO layers grown on Al2O3 and SiO2 using metallo-organic chemical vapour deposition

dc.contributor.author	Chou, H. Y.
dc.contributor.author	Badylevich, M.
dc.contributor.author	Afanas'ev, V. V.
dc.contributor.author	Houssa, M.
dc.contributor.author	Stesmans, A.
dc.contributor.author	Meersschaut, Johan
dc.contributor.author	Goux, Ludovic
dc.contributor.author	Kittl, Jorge
dc.contributor.author	Wouters, Dirk
dc.contributor.imecauthor	Meersschaut, Johan
dc.contributor.imecauthor	Goux, Ludovic
dc.contributor.orcidimec	Meersschaut, Johan::0000-0003-2467-1784
dc.contributor.orcidimec	Goux, Ludovic::0000-0002-1276-2278
dc.date.accessioned	2021-10-19T12:49:53Z
dc.date.available	2021-10-19T12:49:53Z
dc.date.issued	2011-12
dc.identifier.issn	0021-8979
dc.identifier.uri	https://imec-publications.be/handle/20.500.12860/18694
dc.identifier.url	http://link.aip.org/link/?JAP/110/113724
dc.source.beginpage	113724
dc.source.issue	11
dc.source.journal	Journal of Applied Physics
dc.source.volume	110
dc.title	Electronic structure of NiO layers grown on Al2O3 and SiO2 using metallo-organic chemical vapour deposition
dc.type	Journal article
dspace.entity.type	Publication
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