Publication:

Physical characterization of high-k HfxAl1-xOy gate dielectrics prepared by ALD

Date

2011
Proceedings Paper
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Author(s)

Christiano, Verônica
;
Adelmann, Christoph  
;
Kellermann, Guinther
;
Verdonck, Patrick  
;
Dos Santos Filho, Sebastio G.

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1831 since deposited on 2021-10-19
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