Publication:

The metal hard-mask approach for contact patterning

Date

2010
Proceedings Paper
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dc.contributor.authorde Marneffe, Jean-Francois
dc.contributor.authorLazzarino, Frederic
dc.contributor.authorGoossens, Danny
dc.contributor.authorConard, Thierry
dc.contributor.authorHoflijk, Ilse
dc.contributor.authorShamiryan, Denis
dc.contributor.authorStruyf, Herbert
dc.contributor.authorBoullart, Werner
dc.contributor.imecauthorde Marneffe, Jean-Francois
dc.contributor.imecauthorLazzarino, Frederic
dc.contributor.imecauthorGoossens, Danny
dc.contributor.imecauthorConard, Thierry
dc.contributor.imecauthorHoflijk, Ilse
dc.contributor.imecauthorStruyf, Herbert
dc.contributor.imecauthorBoullart, Werner
dc.contributor.orcidimecLazzarino, Frederic::0000-0001-7961-9727
dc.contributor.orcidimecConard, Thierry::0000-0002-4298-5851
dc.contributor.orcidimecBoullart, Werner::0000-0001-7614-2097
dc.date.accessioned2021-10-18T15:49:26Z
dc.date.available2021-10-18T15:49:26Z
dc.date.embargo9999-12-31
dc.date.issued2010
dc.identifier.urihttps://imec-publications.be/handle/20.500.12860/16952
dc.source.beginpage752106
dc.source.conferenceInternational Conference on Micro- and Nanoelectronics 2009
dc.source.conferencedate5/10/2009
dc.source.conferencelocationMoscow Russia
dc.title

The metal hard-mask approach for contact patterning

dc.typeProceedings paper
dspace.entity.typePublication
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