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The impact of probe penetration on the electrical characterization of sub-50 nm profiles

Date

2001
Proceedings Paper
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dc.contributor.authorClarysse, Trudo
dc.contributor.authorVanhaeren, Danielle
dc.contributor.authorVandervorst, Wilfried
dc.contributor.imecauthorVanhaeren, Danielle
dc.contributor.imecauthorVandervorst, Wilfried
dc.contributor.orcidimecVanhaeren, Danielle::0000-0001-8624-9533
dc.date.accessioned2021-10-14T16:42:26Z
dc.date.available2021-10-14T16:42:26Z
dc.date.embargo9999-12-31
dc.date.issued2001
dc.identifier.urihttps://imec-publications.be/handle/20.500.12860/5151
dc.source.beginpage146
dc.source.conference6th Int. Workshop on Fabrication, Characterization and Modeling of Ultra-Shallow Doping Profiles in Semiconductors - USJ
dc.source.conferencedate22/04/2001
dc.source.conferencelocationNapa, CA USA
dc.source.endpage157
dc.title

The impact of probe penetration on the electrical characterization of sub-50 nm profiles

dc.typeProceedings paper
dspace.entity.typePublication
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