Publication:
Low temperature source / drain epitaxy and functional silicides: essentials for ultimate contact scaling
| dc.contributor.author | Porret, Clément | |
| dc.contributor.author | Everaert, Jean-Luc | |
| dc.contributor.author | Schaekers, Marc | |
| dc.contributor.author | Ragnarsson, Lars-Ake | |
| dc.contributor.author | Hikavyy, Andriy | |
| dc.contributor.author | Rosseel, Erik | |
| dc.contributor.author | Rengo, Gianluca | |
| dc.contributor.author | Loo, Roger | |
| dc.contributor.author | Khazaka, R. | |
| dc.contributor.author | Givens, M. | |
| dc.contributor.author | Piao, Xiaoyu | |
| dc.contributor.author | Mertens, Sofie | |
| dc.contributor.author | Heylen, Nancy | |
| dc.contributor.author | Mertens, Hans | |
| dc.contributor.author | Toledo de Carvalho Cavalcante, Camila | |
| dc.contributor.author | Sterckx, Gunther | |
| dc.contributor.author | Brus, Stephan | |
| dc.contributor.author | Nalin Mehta, Ankit | |
| dc.contributor.author | Korytov, Maxim | |
| dc.contributor.author | Batuk, Dmitry | |
| dc.contributor.imecauthor | Porret, Clément | |
| dc.contributor.imecauthor | Everaert, Jean-Luc | |
| dc.contributor.imecauthor | Schaekers, Marc | |
| dc.contributor.imecauthor | Ragnarsson, Lars-Ake | |
| dc.contributor.imecauthor | Hikavyy, Andriy | |
| dc.contributor.imecauthor | Rosseel, Erik | |
| dc.contributor.imecauthor | Rengo, Gianluca | |
| dc.contributor.imecauthor | Loo, Roger | |
| dc.contributor.imecauthor | Piao, Xiaoyu | |
| dc.contributor.imecauthor | Mertens, Sofie | |
| dc.contributor.imecauthor | Heylen, Nancy | |
| dc.contributor.imecauthor | Mertens, Hans | |
| dc.contributor.imecauthor | Toledo de Carvalho Cavalcante, Camila | |
| dc.contributor.imecauthor | Sterckx, Gunther | |
| dc.contributor.imecauthor | Brus, Stephan | |
| dc.contributor.imecauthor | Nalin Mehta, Ankit | |
| dc.contributor.imecauthor | Korytov, Maxim | |
| dc.contributor.imecauthor | Batuk, Dmitry | |
| dc.contributor.imecauthor | Favia, Paola | |
| dc.contributor.imecauthor | Langer, Robert | |
| dc.contributor.orcidimec | Porret, Clément::0000-0002-4561-348X | |
| dc.contributor.orcidimec | Everaert, Jean-Luc::0000-0002-0660-9090 | |
| dc.contributor.orcidimec | Schaekers, Marc::0000-0002-1496-7816 | |
| dc.contributor.orcidimec | Ragnarsson, Lars-Ake::0000-0003-1057-8140 | |
| dc.contributor.orcidimec | Hikavyy, Andriy::0000-0002-8201-075X | |
| dc.contributor.orcidimec | Loo, Roger::0000-0003-3513-6058 | |
| dc.contributor.orcidimec | Mertens, Sofie::0000-0002-1482-6730 | |
| dc.contributor.orcidimec | Brus, Stephan::0000-0003-3554-0640 | |
| dc.contributor.orcidimec | Nalin Mehta, Ankit::0000-0002-2169-940X | |
| dc.contributor.orcidimec | Batuk, Dmitry::0000-0002-6384-6690 | |
| dc.contributor.orcidimec | Favia, Paola::0000-0002-1019-3497 | |
| dc.contributor.orcidimec | Langer, Robert::0000-0002-1132-3468 | |
| dc.contributor.orcidimec | Pourtois, Geoffrey::0000-0003-2597-8534 | |
| dc.contributor.orcidimec | Dentoni Litta, Eugenio::0000-0003-0333-376X | |
| dc.contributor.orcidimec | Horiguchi, Naoto::0000-0001-5490-0416 | |
| dc.contributor.orcidimec | Rengo, Gianluca::0000-0002-3410-6466 | |
| dc.contributor.orcidimec | Piao, Xiaoyu::0000-0002-2204-9636 | |
| dc.contributor.orcidimec | Heylen, Nancy::0009-0008-0490-0993 | |
| dc.contributor.orcidimec | Mertens, Hans::0000-0002-3392-6892 | |
| dc.contributor.orcidimec | Toledo de Carvalho Cavalcante, Camila::0009-0009-8055-5703 | |
| dc.date.accessioned | 2023-06-01T14:45:05Z | |
| dc.date.available | 2023-05-25T20:20:01Z | |
| dc.date.available | 2023-06-01T14:45:05Z | |
| dc.date.issued | 2022 | |
| dc.description.wosFundingText | The imec core program members, the European Commission, local authorities, the imec pilot line, the imec material characterization and analysis group, ASM and Air Liquide Advanced Materials are acknowledged for their support. This project received funding from the ECSEL Joint Undertaking (JU) under grant agreement No 875999. The JU receives support from the European Union's Horizon 2020 research and innovation programme and Netherlands, Belgium, Germany, France, Austria, Hungary, United Kingdom, Romania, Israel. | |
| dc.identifier.doi | 10.1109/IEDM45625.2022.10019501 | |
| dc.identifier.eisbn | 978-1-6654-8959-1 | |
| dc.identifier.issn | 2380-9248 | |
| dc.identifier.uri | https://imec-publications.be/handle/20.500.12860/41621 | |
| dc.publisher | IEEE | |
| dc.source.conference | International Electron Devices Meeting (IEDM) | |
| dc.source.conferencedate | DEC 03-07, 2022 | |
| dc.source.conferencelocation | San Francisco | |
| dc.source.journal | na | |
| dc.source.numberofpages | 4 | |
| dc.title | Low temperature source / drain epitaxy and functional silicides: essentials for ultimate contact scaling | |
| dc.type | Proceedings paper | |
| dspace.entity.type | Publication | |
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