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Area-selective deposition by surface engineering for applications in nanoelectronics. From blanket to confined dimensions

Date

2018
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dc.contributor.authorArmini, Silvia
dc.contributor.authorZyulkov, Ivan
dc.contributor.imecauthorArmini, Silvia
dc.contributor.imecauthorZyulkov, Ivan
dc.contributor.orcidimecArmini, Silvia::0000-0003-0578-3422
dc.date.accessioned2021-10-25T16:34:29Z
dc.date.available2021-10-25T16:34:29Z
dc.date.issued2018
dc.identifier.urihttps://imec-publications.be/handle/20.500.12860/30145
dc.identifier.urlhttps://www2.avs.org/symposium2018/Papers/Paper_SE+PS-TuM3.html
dc.source.beginpageSE+PS-TuM3
dc.source.conferenceAVS 65th International Symposium & Exhibition
dc.source.conferencedate22/10/2018
dc.source.conferencelocationLong beach, CA USA
dc.title

Area-selective deposition by surface engineering for applications in nanoelectronics. From blanket to confined dimensions

dc.typeMeeting abstract
dspace.entity.typePublication
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