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Pure-Metal Replacement Gate for Reliable 30 nm Pitch Scaled 3D NAND Flash

 
dc.contributor.authorRachidi, Sana
dc.contributor.authorRamesh, Siva
dc.contributor.authorTierno, Davide
dc.contributor.authorDonadio, Gabriele Luca
dc.contributor.authorPacco, Antoine
dc.contributor.authorMaes, J. W.
dc.contributor.authorJeong, Yongbin
dc.contributor.authorArreghini, Antonio
dc.contributor.authorVan den Bosch, Geert
dc.contributor.authorRosmeulen, Maarten
dc.contributor.imecauthorRachidi, S.
dc.contributor.imecauthorRamesh, S.
dc.contributor.imecauthorTierno, D.
dc.contributor.imecauthorDonadio, G. L.
dc.contributor.imecauthorPacco, A.
dc.contributor.imecauthorJeong, Y.
dc.contributor.imecauthorArreghini, A.
dc.contributor.imecauthorVan den Bosch, G.
dc.contributor.imecauthorRosmeulen, M.
dc.date.accessioned2024-07-12T18:43:08Z
dc.date.available2024-07-12T18:43:08Z
dc.date.issued2024
dc.description.wosFundingTextThis work has been funded by imec's Industrial Affiliation Program on Storage Memory devices.
dc.identifier.doi10.1109/IMW59701.2024.10536954
dc.identifier.eisbn979-8-3503-0652-1
dc.identifier.issn2330-7978
dc.identifier.urihttps://imec-publications.be/handle/20.500.12860/44148
dc.publisherIEEE
dc.source.conferenceInternational Memory Workshop (IMW)
dc.source.conferencedate2024-05-12
dc.source.conferencelocationSeoul
dc.source.numberofpages4
dc.subject.keywordsMOLYBDENUM
dc.title

Pure-Metal Replacement Gate for Reliable 30 nm Pitch Scaled 3D NAND Flash

dc.typeProceedings paper
dspace.entity.typePublication
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