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Alternative photoresist removal process to minimize damage of low-k material induced by ash plasma
Publication:
Alternative photoresist removal process to minimize damage of low-k material induced by ash plasma
Date
2008
Journal article
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Basic data
APA
Chicago
Harvard
IEEE
Basic data
APA
Chicago
Harvard
IEEE
Author(s)
Le, Quoc Toan
;
Keldermans, Johan
;
Chiodarelli, Nicolo
;
Kesters, Els
;
Lux, Marcel
;
Claes, Martine
;
Vereecke, Guy
Journal
Japanese Journal of Applied Physics
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1935
since deposited on 2021-10-17
2
last month
Acq. date: 2025-12-08
Citations
Metrics
Views
1935
since deposited on 2021-10-17
2
last month
Acq. date: 2025-12-08
Citations