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Modification of photoresist by UV for post-etch wet strip applications
Publication:
Modification of photoresist by UV for post-etch wet strip applications
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Date
2008
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APA
Chicago
Harvard
IEEE
Basic data
APA
Chicago
Harvard
IEEE
Author(s)
Le, Quoc Toan
;
Kesters, Els
;
Claes, Martine
;
Lux, Marcel
;
Vereecke, Guy
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Acq. date: 2026-02-24
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Statistics
Views
1866
since deposited on 2021-10-17
1
last month
Acq. date: 2026-02-24
Citations