Publication:

Lithography imaging control by enhanced monitoring of light source performance

Date

2013
Proceedings Paper
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dc.contributor.authorAlagna, Paolo
dc.contributor.authorZurita, Omar
dc.contributor.authorLalovic, Ivan
dc.contributor.authorSeong, Nakgeuon
dc.contributor.authorRechsteiner, Gregory
dc.contributor.authorThornes, Joshua
dc.contributor.authorD'have, Koen
dc.contributor.authorVan Look, Lieve
dc.contributor.authorBekaert, Joost
dc.contributor.imecauthorAlagna, Paolo
dc.contributor.imecauthorD'have, Koen
dc.contributor.imecauthorVan Look, Lieve
dc.contributor.imecauthorBekaert, Joost
dc.contributor.orcidimecD'have, Koen::0000-0002-5195-9241
dc.contributor.orcidimecBekaert, Joost::0000-0003-3075-3479
dc.date.accessioned2021-10-21T06:42:12Z
dc.date.available2021-10-21T06:42:12Z
dc.date.issued2013
dc.identifier.urihttps://imec-publications.be/handle/20.500.12860/21960
dc.source.beginpage86830S
dc.source.conferenceOptical Microlithography XXVI
dc.source.conferencedate24/02/2013
dc.source.conferencelocationSan Jose, CA USA
dc.title

Lithography imaging control by enhanced monitoring of light source performance

dc.typeProceedings paper
dspace.entity.typePublication
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