Publication:
Smooth and high quality epitaxial strained Ge grown on SiGe strain relaxed buffers with 70 - 85% Ge
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1910 since deposited on 2021-10-18
Acq. date: 2025-12-15
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Views
1910 since deposited on 2021-10-18
Acq. date: 2025-12-15
Citations