Publication:
Resolution enhancement techniques in optical lithography
Date
| dc.contributor.author | Ronse, Kurt | |
| dc.contributor.author | Van den hove, Luc | |
| dc.contributor.imecauthor | Ronse, Kurt | |
| dc.contributor.imecauthor | Van den hove, Luc | |
| dc.contributor.orcidimec | Ronse, Kurt::0000-0003-0803-4267 | |
| dc.date.accessioned | 2021-10-14T11:35:48Z | |
| dc.date.available | 2021-10-14T11:35:48Z | |
| dc.date.embargo | 9999-12-31 | |
| dc.date.issued | 1999 | |
| dc.identifier.uri | https://imec-publications.be/handle/20.500.12860/3780 | |
| dc.source.beginpage | 241 | |
| dc.source.journal | Semiconductor Fabtech | |
| dc.source.volume | 10 | |
| dc.title | Resolution enhancement techniques in optical lithography | |
| dc.type | Journal article | |
| dspace.entity.type | Publication | |
| Files | Original bundle
| |
| Publication available in collections: |