Apparent and steady-state etch rates in thin film etching and underetching of microstructures. II: Characterisation

dc.contributor.author	Van Barel, Gregory
dc.contributor.author	Du Bois, Bert
dc.contributor.author	Van Hoof, Rita
dc.contributor.author	De Wachter, Jef
dc.contributor.author	De Ceuninck, Ward
dc.contributor.author	Witvrouw, Ann
dc.contributor.imecauthor	Du Bois, Bert
dc.contributor.imecauthor	Van Hoof, Rita
dc.contributor.imecauthor	De Ceuninck, Ward
dc.contributor.orcidimec	Du Bois, Bert::0000-0003-0147-1296
dc.date.accessioned	2021-10-18T22:46:21Z
dc.date.available	2021-10-18T22:46:21Z
dc.date.issued	2010
dc.identifier.issn	0960-1317
dc.identifier.uri	https://imec-publications.be/handle/20.500.12860/18142
dc.identifier.url	http://iopscience.iop.org/0960-1317/20/5/055034
dc.source.beginpage	55034
dc.source.issue	5
dc.source.journal	Journal of Micromechanics and Microengineering
dc.source.volume	20
dc.title	Apparent and steady-state etch rates in thin film etching and underetching of microstructures. II: Characterisation
dc.type	Journal article
dspace.entity.type	Publication
Files
Publication available in collections:	Articles

Date