Publication:

Molecular base sensitivity studies of various DUV resists used in semiconductor fabrication

Date

2001
Proceedings Paper
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dc.contributor.authorRuede, David
dc.contributor.authorErcken, Monique
dc.contributor.authorBorgers, Tom
dc.contributor.imecauthorErcken, Monique
dc.contributor.imecauthorBorgers, Tom
dc.contributor.orcidimecBorgers, Tom::0000-0002-7878-6977
dc.date.accessioned2021-10-14T18:42:42Z
dc.date.available2021-10-14T18:42:42Z
dc.date.embargo9999-12-31
dc.date.issued2001
dc.identifier.urihttps://imec-publications.be/handle/20.500.12860/5925
dc.source.beginpage1020
dc.source.conferenceOptical Microlithography XIV
dc.source.conferencedate27/02/2001
dc.source.conferencelocationSanta Clara, CA USA
dc.title

Molecular base sensitivity studies of various DUV resists used in semiconductor fabrication

dc.typeProceedings paper
dspace.entity.typePublication
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