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Dry etching patterning requirements for multi-gate devices
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Dry etching patterning requirements for multi-gate devices
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Date
2013-09
Book Chapter
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APA
Chicago
Harvard
IEEE
Basic data
APA
Chicago
Harvard
IEEE
Author(s)
Altamirano Sanchez, Efrain
;
Vandeweyer, Tom
;
Demand, Marc
;
Boullart, Werner
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1909
since deposited on 2021-10-21
Acq. date: 2025-12-15
Citations
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Views
1909
since deposited on 2021-10-21
Acq. date: 2025-12-15
Citations