Removing metal gate process residues

dc.contributor.author	Snow, Jim
dc.contributor.author	Fyen, Wim
dc.contributor.author	Mertens, Paul
dc.contributor.author	Kraus, Harald
dc.contributor.author	Kovacs, F.
dc.contributor.author	Vermeyen, K.
dc.contributor.imecauthor	Mertens, Paul
dc.date.accessioned	2021-10-15T16:19:58Z
dc.date.available	2021-10-15T16:19:58Z
dc.date.embargo	9999-12-31
dc.date.issued	2004
dc.identifier.uri	https://imec-publications.be/handle/20.500.12860/9615
dc.source.beginpage	61
dc.source.endpage	62
dc.source.issue	4
dc.source.journal	European Semiconductor
dc.source.volume	26
dc.title	Removing metal gate process residues
dc.type	Journal article
dspace.entity.type	Publication
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