Publication:
Sub-resolution grating as an option for mask 3D effect mitigation in anamorphic imaging system
| dc.contributor.author | Lee, Inhwan | |
| dc.contributor.author | Franke, Joern-Holger | |
| dc.contributor.author | Philipsen, Vicky | |
| dc.contributor.author | Ronse, Kurt | |
| dc.contributor.author | De Gendt, Stefan | |
| dc.contributor.author | Hendrickx, Eric | |
| dc.contributor.imecauthor | Lee, Inhwan | |
| dc.contributor.imecauthor | Franke, Joern-Holger | |
| dc.contributor.imecauthor | Philipsen, Vicky | |
| dc.contributor.imecauthor | Ronse, Kurt | |
| dc.contributor.imecauthor | De Gendt, Stefan | |
| dc.contributor.imecauthor | Hendrickx, Eric | |
| dc.contributor.orcidimec | Lee, Inhwan::0000-0002-3283-5075 | |
| dc.contributor.orcidimec | Franke, Joern-Holger::0000-0002-3571-1633 | |
| dc.contributor.orcidimec | Philipsen, Vicky::0000-0002-2959-432X | |
| dc.contributor.orcidimec | Ronse, Kurt::0000-0003-0803-4267 | |
| dc.contributor.orcidimec | De Gendt, Stefan::0000-0003-3775-3578 | |
| dc.contributor.orcidimec | Hendrickx, Eric::0000-0003-2516-0417 | |
| dc.date.accessioned | 2025-05-17T05:44:54Z | |
| dc.date.available | 2025-05-17T05:44:54Z | |
| dc.date.issued | 2025-JAN 1 | |
| dc.description.wosFundingText | The authors would like to thank Gerardo Bottiglieri from ASML, Jens Timo Neumann, Michael Patra, Ralf Scharnweber, Heiko Feldmann, Joerg Zimmermann from Zeiss, Peter De Bisschop, Nick Pellens from IMEC, Andreas Erdmann from Fraunhofer IISB, Chang-Moon Lim from SK Hynix, and Ulrich Klostermann, Ulrich Welling, Juergen Preuninger from Synopsys for valuable discussions. We used S-Litho EUV of Synopsys and Hyperlith of Panoramic Technology for simulation works. Parts of the paper were previously published as SPIE proceedings.24 | |
| dc.identifier.doi | 10.1117/1.JMM.24.1.011007 | |
| dc.identifier.issn | 1932-5150 | |
| dc.identifier.uri | https://imec-publications.be/handle/20.500.12860/45674 | |
| dc.publisher | SPIE-SOC PHOTO-OPTICAL INSTRUMENTATION ENGINEERS | |
| dc.source.issue | 1 | |
| dc.source.journal | JOURNAL OF MICRO-NANOPATTERNING MATERIALS AND METROLOGY-JM3 | |
| dc.source.numberofpages | 21 | |
| dc.source.volume | 24 | |
| dc.title | Sub-resolution grating as an option for mask 3D effect mitigation in anamorphic imaging system | |
| dc.type | Journal article | |
| dspace.entity.type | Publication | |
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