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A year of new mask defectivity insights in imec's EUVL program
Publication:
A year of new mask defectivity insights in imec's EUVL program
Date
2013
Proceedings Paper
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APA
Chicago
Harvard
IEEE
Basic data
APA
Chicago
Harvard
IEEE
Author(s)
Jonckheere, Rik
;
Van Den Heuvel, Dieter
;
Baudemprez, Bart
;
Jehoul, Christiane
;
Pacco, Antoine
Journal
Abstract
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1932
since deposited on 2021-10-21
420
item.page.metrics.field.last-week
Acq. date: 2025-10-25
Citations
Metrics
Views
1932
since deposited on 2021-10-21
420
item.page.metrics.field.last-week
Acq. date: 2025-10-25
Citations