Publication:
Soft breakdown of ultra-thin gate oxide layers
Date
| dc.contributor.author | Depas, Michel | |
| dc.contributor.author | Nigam, Tanya | |
| dc.contributor.author | Heyns, Marc | |
| dc.contributor.imecauthor | Heyns, Marc | |
| dc.date.accessioned | 2021-09-29T14:27:07Z | |
| dc.date.available | 2021-09-29T14:27:07Z | |
| dc.date.embargo | 9999-12-31 | |
| dc.date.issued | 1996 | |
| dc.identifier.uri | https://imec-publications.be/handle/20.500.12860/1204 | |
| dc.source.beginpage | 1499 | |
| dc.source.endpage | 1504 | |
| dc.source.issue | 9 | |
| dc.source.journal | IEEE Transactions on Electron Devices | |
| dc.source.volume | 43 | |
| dc.title | Soft breakdown of ultra-thin gate oxide layers | |
| dc.type | Journal article | |
| dspace.entity.type | Publication | |
| Files | Original bundle
| |
| Publication available in collections: |