Publication:

Implementation of molecular ion implant technology for PMOS extension

Date

2008
Proceedings Paper
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dc.contributor.authorFalepin, Annelies
dc.contributor.authorCollart, Erik
dc.contributor.authorTran, Sandra
dc.contributor.authorHarris, Mark
dc.contributor.authorAmeen, Mike
dc.contributor.authorHoffmann, Thomas Y.
dc.contributor.authorRosseel, Erik
dc.contributor.authorSaino, Kanto
dc.contributor.authorHoriguchi, Naoto
dc.contributor.authorAbsil, Philippe
dc.contributor.imecauthorFalepin, Annelies
dc.contributor.imecauthorRosseel, Erik
dc.contributor.imecauthorHoriguchi, Naoto
dc.contributor.imecauthorAbsil, Philippe
dc.contributor.orcidimecHoriguchi, Naoto::0000-0001-5490-0416
dc.date.accessioned2021-10-17T07:04:21Z
dc.date.available2021-10-17T07:04:21Z
dc.date.embargo9999-12-31
dc.date.issued2008
dc.identifier.urihttps://imec-publications.be/handle/20.500.12860/13714
dc.source.beginpage46
dc.source.conference8th International Workshop on Junction Technology - IWJT
dc.source.conferencedate15/05/2008
dc.source.conferencelocationShangai China
dc.source.endpage48
dc.title

Implementation of molecular ion implant technology for PMOS extension

dc.typeProceedings paper
dspace.entity.typePublication
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