Skip to content
Institutional repository
Communities & Collections
Browse all items
Scientific publications
Open knowledge
Log In
imec Publications
Articles
Scalability comparison between raised- and embedded-SiGe source/drain structures for Si0.55Ge0.45 implant free quantum well pFET
Publication:
Scalability comparison between raised- and embedded-SiGe source/drain structures for Si0.55Ge0.45 implant free quantum well pFET
Copy permalink
Date
2018-04
Journal article
Simple item page
Full metadata
Statistics
Loading...
Loading...
Basic data
APA
Chicago
Harvard
IEEE
Basic data
APA
Chicago
Harvard
IEEE
Author(s)
Yamaguchi, Shimpei
;
Witters, Liesbeth
;
Mitard, Jerome
;
Eneman, Geert
;
Hellings, Geert
;
Hikavyy, Andriy
;
Loo, Roger
;
Horiguchi, Naoto
Journal
Microelectronics Reliability
Abstract
Description
Metrics
Views
1881
since deposited on 2021-10-26
1
last month
Acq. date: 2025-12-15
Citations
Metrics
Views
1881
since deposited on 2021-10-26
1
last month
Acq. date: 2025-12-15
Citations