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Effect of 147nm photons on porous Organo-Silicon Glass materials and damage improvement by optimized Cu/low-k integration approaches

Date

2014
Meeting abstract
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dc.contributor.authorZhang, Liping
dc.contributor.authorde Marneffe, Jean-Francois
dc.contributor.authorLukaszewicz, Mikolaj
dc.contributor.authorBarry-Porter, Stephen
dc.contributor.authorVajda, Felim
dc.contributor.authorSun, Yiting
dc.contributor.authorHeyne, Markus
dc.contributor.authorBaklanov, Mikhaïl
dc.contributor.authorRutiqlian, Vito
dc.contributor.imecauthorZhang, Liping
dc.contributor.imecauthorde Marneffe, Jean-Francois
dc.contributor.imecauthorSun, Yiting
dc.date.accessioned2021-10-22T08:56:18Z
dc.date.available2021-10-22T08:56:18Z
dc.date.issued2014
dc.identifier.urihttps://imec-publications.be/handle/20.500.12860/24887
dc.identifier.urlhttp://www2.avs.org/symposium2014/Papers/Paper_PS-MoM4.html
dc.source.beginpagePS-MoM4
dc.source.conferenceAVS 61st International Symposium and Exhibition
dc.source.conferencedate9/11/2014
dc.source.conferencelocationBaltimore USA
dc.title

Effect of 147nm photons on porous Organo-Silicon Glass materials and damage improvement by optimized Cu/low-k integration approaches

dc.typeMeeting abstract
dspace.entity.typePublication
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