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Preparation of epitaxial films of the transparant conductive oxide Al:ZnO by reactive high-pressure sputtering in Ar/O2 mixtures

Date

2013
Journal article
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dc.contributor.authorVan Gompel, Matthias
dc.contributor.authorConings, Bert
dc.contributor.authorJiménez-Monroy, Kathia L.
dc.contributor.authorD'Haen, Jan
dc.contributor.authorGilissen, Koen
dc.contributor.authorD'Olieslaeger, Marc
dc.contributor.authorVan Bael, Marlies
dc.contributor.authorWagner, Patrick
dc.contributor.imecauthorConings, Bert
dc.contributor.imecauthorD'Haen, Jan
dc.contributor.imecauthorD'Olieslaeger, Marc
dc.contributor.imecauthorVan Bael, Marlies
dc.contributor.orcidimecVan Bael, Marlies::0000-0002-5516-7962
dc.date.accessioned2021-10-21T13:24:43Z
dc.date.available2021-10-21T13:24:43Z
dc.date.embargo9999-12-31
dc.date.issued2013
dc.identifier.issn1862-6300
dc.identifier.urihttps://imec-publications.be/handle/20.500.12860/23251
dc.identifier.urlhttp://onlinelibrary.wiley.com/doi/10.1002/pssa.201200986/abstract
dc.source.beginpage1013
dc.source.endpage1018
dc.source.issue5
dc.source.journalPhysica Status Solidi A
dc.source.volume210
dc.title

Preparation of epitaxial films of the transparant conductive oxide Al:ZnO by reactive high-pressure sputtering in Ar/O2 mixtures

dc.typeJournal article
dspace.entity.typePublication
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