Publication:

Light-matter interactions in photoresists for Extreme Ultraviolet Lithography. From conventional chemically amplified resists to alternative photoresists

Date

2019-04
Dissertation
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dc.contributor.authorVesters, Yannick
dc.contributor.thesisadvisorDe Gendt, Stefan
dc.contributor.thesisadvisorDe Simone, Danilo
dc.date.accessioned2021-10-27T22:49:49Z
dc.date.available2021-10-27T22:49:49Z
dc.date.embargo9999-12-31
dc.date.issued2019-04
dc.identifier.urihttps://imec-publications.be/handle/20.500.12860/34388
dc.identifier.urlhttps://limo.libis.be/primo-explore/fulldisplay?docid=LIRIAS2379237&context=L&vid=Lirias&search_scope=Lirias&tab=default_tab&lang=en_US&fromSitemap=1
dc.title

Light-matter interactions in photoresists for Extreme Ultraviolet Lithography. From conventional chemically amplified resists to alternative photoresists

dc.typePHD thesis
dspace.entity.typePublication
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