Publication:

Separable models for computational lithography

Date

2008
Proceedings Paper
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dc.contributor.authorLiu, Hua-Yu
dc.contributor.authorZhao, Q.
dc.contributor.authorChen, J.F.
dc.contributor.authorJiang, J.
dc.contributor.authorSocha, B.
dc.contributor.authorVan Setten, E.
dc.contributor.authorEngelen, A.
dc.contributor.authorMeessen, J.
dc.contributor.authorCrouse, M.M.
dc.contributor.authorFeng, M.
dc.contributor.authorShao, W.
dc.contributor.authorCao, H.
dc.contributor.authorCao, Y.
dc.contributor.authorVan Look, Lieve
dc.contributor.authorBekaert, Joost
dc.contributor.authorVandenberghe, Geert
dc.contributor.authorFinders, Jo
dc.contributor.imecauthorVan Look, Lieve
dc.contributor.imecauthorBekaert, Joost
dc.contributor.imecauthorVandenberghe, Geert
dc.contributor.orcidimecBekaert, Joost::0000-0003-3075-3479
dc.date.accessioned2021-10-17T08:27:17Z
dc.date.available2021-10-17T08:27:17Z
dc.date.embargo9999-12-31
dc.date.issued2008
dc.identifier.urihttps://imec-publications.be/handle/20.500.12860/14049
dc.source.beginpage70280X
dc.source.conferencePhotomask and Next-Generation Lithography Mask Technology XV
dc.source.conferencedate16/04/2008
dc.source.conferencelocationYokohama Japan
dc.title

Separable models for computational lithography

dc.typeProceedings paper
dspace.entity.typePublication
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