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Influence of the As and BF2 junction implantation on the stress induced defects during the Ti- and Co/Ti-silicidation
Publication:
Influence of the As and BF2 junction implantation on the stress induced defects during the Ti- and Co/Ti-silicidation
Date
1999
Proceedings Paper
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3820.pdf
638.79 KB
Basic data
APA
Chicago
Harvard
IEEE
Basic data
APA
Chicago
Harvard
IEEE
Author(s)
Steegen, An
;
Bender, Hugo
;
De Wolf, Ingrid
;
Maex, Karen
Journal
Abstract
Description
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1998
since deposited on 2021-10-14
Acq. date: 2025-10-24
Citations
Metrics
Views
1998
since deposited on 2021-10-14
Acq. date: 2025-10-24
Citations