Publication:

Silicide scaling: Co, Ni or CoNi ?

Date

2003
Proceedings Paper
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dc.contributor.authorLauwers, Anne
dc.contributor.authorKittl, Jorge
dc.contributor.authorAkheyar, Amal
dc.contributor.authorVan Dal, Mark
dc.contributor.authorChamirian, Oxana
dc.contributor.authorde Potter de ten Broeck, Muriel
dc.contributor.authorLindsay, Richard
dc.contributor.authorMaex, Karen
dc.contributor.imecauthorLauwers, Anne
dc.contributor.imecauthorVan Dal, Mark
dc.contributor.imecauthorde Potter de ten Broeck, Muriel
dc.contributor.imecauthorMaex, Karen
dc.date.accessioned2021-10-15T05:19:52Z
dc.date.available2021-10-15T05:19:52Z
dc.date.issued2003
dc.identifier.urihttps://imec-publications.be/handle/20.500.12860/7785
dc.source.beginpage167
dc.source.conferenceAdvanced Short-Time Thermal Processing for Si-based CMOS devices
dc.source.conferencedate27/04/2003
dc.source.conferencelocationParis France
dc.source.endpage176
dc.title

Silicide scaling: Co, Ni or CoNi ?

dc.typeProceedings paper
dspace.entity.typePublication
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