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Engineering of the polysilicon emitter interfacial layer using low temperature thermal re-oxidation in an LPCVD cluster tool
Publication:
Engineering of the polysilicon emitter interfacial layer using low temperature thermal re-oxidation in an LPCVD cluster tool
Date
1995
Proceedings Paper
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Basic data
APA
Chicago
Harvard
IEEE
Basic data
APA
Chicago
Harvard
IEEE
Author(s)
Decoutere, Stefaan
;
Cuthbertson, Alan
;
Wilhelm, Rudi
;
Vandervorst, Wilfried
;
Deferm, Ludo
Journal
Abstract
Description
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2036
since deposited on 2021-09-29
Acq. date: 2025-10-23
Citations
Metrics
Views
2036
since deposited on 2021-09-29
Acq. date: 2025-10-23
Citations