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Study on practical application of pattern top resist loss measurement by CD-SEM for high NA immersion lithography

Date

2010
Proceedings Paper
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dc.contributor.authorIshimoto, Toru
dc.contributor.authorYasui, Naoki
dc.contributor.authorHasegawa, Norio
dc.contributor.authorTanaka, Maki
dc.contributor.authorCheng, Shaunee
dc.date.accessioned2021-10-18T17:19:19Z
dc.date.available2021-10-18T17:19:19Z
dc.date.embargo9999-12-31
dc.date.issued2010
dc.identifier.urihttps://imec-publications.be/handle/20.500.12860/17308
dc.source.beginpage76382P
dc.source.conferenceMetrology, Inspection and Process Control for Microlithography XXIV
dc.source.conferencedate21/02/2010
dc.source.conferencelocationSan Jose, CA USA
dc.title

Study on practical application of pattern top resist loss measurement by CD-SEM for high NA immersion lithography

dc.typeProceedings paper
dspace.entity.typePublication
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