Publication:

Polysilicon encapsulated local oxidation of silicon for deep submicron lateral isolation

Date

1997
Journal article
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dc.contributor.authorBadenes, Gonçal
dc.contributor.authorRooyackers, Rita
dc.contributor.authorDe Wolf, Ingrid
dc.contributor.authorDeferm, Ludo
dc.contributor.imecauthorDe Wolf, Ingrid
dc.contributor.imecauthorDeferm, Ludo
dc.date.accessioned2021-09-30T07:55:08Z
dc.date.available2021-09-30T07:55:08Z
dc.date.embargo9999-12-31
dc.date.issued1997
dc.identifier.urihttps://imec-publications.be/handle/20.500.12860/1707
dc.source.beginpage1325
dc.source.endpage1329
dc.source.issue3B
dc.source.journalJapanese Journal of Applied Physics. Part 1
dc.source.volume36
dc.title

Polysilicon encapsulated local oxidation of silicon for deep submicron lateral isolation

dc.typeJournal article
dspace.entity.typePublication
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