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Influence of the antireflection coating on the electromigration resistance of 0.5 µm technology metal-2 line structures
Publication:
Influence of the antireflection coating on the electromigration resistance of 0.5 µm technology metal-2 line structures
Date
1995
Journal article
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Basic data
APA
Chicago
Harvard
IEEE
Basic data
APA
Chicago
Harvard
IEEE
Author(s)
Stevens, Rudi
;
Witvrouw, Ann
;
Roussel, Philippe
;
Maex, Karen
;
Meynen, Herman
;
Cuthbertson, Alan
Journal
Appl. Surf. Sci.
Abstract
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1
since deposited on 2021-09-29
Acq. date: 2025-10-23
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1976
since deposited on 2021-09-29
Acq. date: 2025-10-23
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Downloads
1
since deposited on 2021-09-29
Acq. date: 2025-10-23
Views
1976
since deposited on 2021-09-29
Acq. date: 2025-10-23
Citations