Skip to content
Institutional repository
Communities & Collections
Browse
Site
Log In
imec Publications
Presentations
Ultra-shallow junction process development for the 45nm CMOS technology node using co-implantation
Publication:
Ultra-shallow junction process development for the 45nm CMOS technology node using co-implantation
Date
2004
Presentation
Simple item page
Full metadata
Statistics
Loading...
Loading...
Basic data
APA
Chicago
Harvard
IEEE
Basic data
APA
Chicago
Harvard
IEEE
Author(s)
Collart, E.J.H.
;
Kirkwood, D.
;
Lindsay, Richard
;
Vandervorst, Wilfried
;
Pawlak, Bartek
Journal
Abstract
Description
Metrics
Views
2025
since deposited on 2021-10-15
Acq. date: 2025-10-24
Citations
Metrics
Views
2025
since deposited on 2021-10-15
Acq. date: 2025-10-24
Citations