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Roughness mitigation at sub-30nm semiconductor patterns: the effect of H2/Ar plasma
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Roughness mitigation at sub-30nm semiconductor patterns: the effect of H2/Ar plasma
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Date
2012
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APA
Chicago
Harvard
IEEE
Basic data
APA
Chicago
Harvard
IEEE
Author(s)
De Schepper, Peter
Journal
Abstract
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1896
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Acq. date: 2025-12-15
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Metrics
Views
1896
since deposited on 2021-10-20
1
last month
Acq. date: 2025-12-15
Citations