Publication:

A comparison between wet HF etching and vapor HF etching for sacrificial oxide removal

Date

2000
Proceedings Paper
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dc.contributor.authorWitvrouw, Ann
dc.contributor.authorDu Bois, Bert
dc.contributor.authorDe Moor, Piet
dc.contributor.authorVerbist, Agnes
dc.contributor.authorVan Hoof, Chris
dc.contributor.authorBender, Hugo
dc.contributor.authorBaert, Kris
dc.contributor.imecauthorDu Bois, Bert
dc.contributor.imecauthorDe Moor, Piet
dc.contributor.imecauthorVan Hoof, Chris
dc.contributor.imecauthorBender, Hugo
dc.contributor.orcidimecDu Bois, Bert::0000-0003-0147-1296
dc.date.accessioned2021-10-14T14:19:52Z
dc.date.available2021-10-14T14:19:52Z
dc.date.issued2000
dc.identifier.urihttps://imec-publications.be/handle/20.500.12860/4945
dc.source.beginpage130
dc.source.conferenceMicromachining and Microfabrication Process Technology VI
dc.source.conferencedate17/09/2000
dc.source.conferencelocationSanta Clara, CA USA
dc.source.endpage141
dc.title

A comparison between wet HF etching and vapor HF etching for sacrificial oxide removal

dc.typeProceedings paper
dspace.entity.typePublication
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