Publication:

Simulation of the post-implantation anneal for emitter profile optimization in high efficiency c-Si solar cells

Date

 
dc.contributor.authorFlorakis, Antonios
dc.contributor.authorVandervorst, Wilfried
dc.contributor.authorJanssens, Tom
dc.contributor.authorRosseel, Erik
dc.contributor.authorDouhard, Bastien
dc.contributor.authorDelmotte, Joris
dc.contributor.authorCornagliotti, Emanuele
dc.contributor.authorBaert, Kris
dc.contributor.authorPosthuma, Niels
dc.contributor.authorPoortmans, Jef
dc.contributor.imecauthorVandervorst, Wilfried
dc.contributor.imecauthorRosseel, Erik
dc.contributor.imecauthorDouhard, Bastien
dc.contributor.imecauthorCornagliotti, Emanuele
dc.contributor.imecauthorPosthuma, Niels
dc.contributor.imecauthorPoortmans, Jef
dc.contributor.orcidimecPosthuma, Niels::0000-0002-6029-1909
dc.contributor.orcidimecPoortmans, Jef::0000-0003-2077-2545
dc.date.accessioned2021-10-20T11:02:20Z
dc.date.available2021-10-20T11:02:20Z
dc.date.issued2012
dc.identifier.urihttps://imec-publications.be/handle/20.500.12860/20685
dc.source.beginpage206
dc.source.conferenceIon Implantation Technology. Proceedings of the 19th International Conference
dc.source.conferencedate25/06/2012
dc.source.conferencelocationValladolid Spain
dc.source.endpage211
dc.title

Simulation of the post-implantation anneal for emitter profile optimization in high efficiency c-Si solar cells

dc.typeProceedings paper
dspace.entity.typePublication
Files
Publication available in collections: